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Proceedings Paper

Key components technology update of the 250W high-power LPP-EUV light source
Author(s): Yasufumi Kawasuji; Krzysztof M. Nowak; Tsukasa Hori; Takeshi Okamoto; Hiroshi Tanaka; Yukio Watanabe; Tamotsu Abe; Takeshi Kodama; Hiroaki Nakarai; Taku Yamazaki; Shinji Okazaki; Takashi Saitou; Hakaru Mizoguchi; Yutaka Shiraishi
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Paper Abstract

13.5nm wavelength, CO2-Sn-LPP EUV light source which is the most promising solution for the source capable of enabling high-volume-manufacturing of semiconductor devices with critical layers patterned with sub-10nm resolution. Our source incorporates unique and original technologies such as; high power short pulse CO2 laser, short wavelength solid-state pre-pulse laser, highly stabilized droplet generator, a laser-droplet shooting control system and debris mitigation technology utilizing a strong magnetic field. In this paper we present a technology update on the key components of our 250W CO2-Sn-LPP EUV light source.

Paper Details

Date Published: 24 March 2017
PDF: 11 pages
Proc. SPIE 10143, Extreme Ultraviolet (EUV) Lithography VIII, 101432G (24 March 2017); doi: 10.1117/12.2257808
Show Author Affiliations
Yasufumi Kawasuji, Gigaphoton Inc. (Japan)
Krzysztof M. Nowak, Gigaphoton Inc. (Japan)
Tsukasa Hori, Gigaphoton Inc. (Japan)
Takeshi Okamoto, Gigaphoton Inc. (Japan)
Hiroshi Tanaka, Gigaphoton Inc. (Japan)
Yukio Watanabe, Gigaphoton Inc. (Japan)
Tamotsu Abe, Gigaphoton Inc. (Japan)
Takeshi Kodama, Gigaphoton Inc. (Japan)
Hiroaki Nakarai, Gigaphoton Inc. (Japan)
Taku Yamazaki, Gigaphoton Inc. (Japan)
Shinji Okazaki, Gigaphoton Inc. (Japan)
Takashi Saitou, Gigaphoton Inc. (Japan)
Hakaru Mizoguchi, Gigaphoton Inc. (Japan)
Yutaka Shiraishi, Gigaphoton Inc. (Japan)

Published in SPIE Proceedings Vol. 10143:
Extreme Ultraviolet (EUV) Lithography VIII
Eric M. Panning, Editor(s)

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