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Proceedings Paper

Immersion lithography scanner resolution performance demonstration on 450mm substrates
Author(s): Christopher R. Carr; Hsin-Hui Huang; HyoungKook Kim; Shannon Dunn; Jasper P. Munson; Russell A. Black; Preston A. Crupe; Victor A. Perez; Takuya Kuroda
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Paper Abstract

The Global 450mm Consortium (G450C) has completed its 5th year of developing and evaluating manufacturing 450mm tool sets. This paper focuses on how the lithography cell resolution performance has progressed from tool acceptance to current day. Initial data will be shown as well as the iterative and final data following process and equipment improvements that have been implemented over the course of the G450C program.

This paper will demonstrate both line/space and contact hole Critical Dimension Uniformity (CDU), one of the key indicators of resolution performance, as well as process window performance on multiple masks and resist processes. The CDU performance shows significant improvement after three main factors were implemented: custom-made photoresist, track process optimization, and Nikon Turnkey CDU Master software application. It will be demonstrated that with the implementation of optimized photoresist, Post Exposure bake (PEB) tuning and CDU Master correction that CDU results of <1nm 3σ may be achieved on 450mm wafers. The final CDU results for contact hole and line/space will be compared to 300mm production tools as well as the N7 and N10 expected requirements.

Besides a traditional 6% Attenuated Phase Shifting Mask (APSM), G450C litho also utilizes thin Opaque MoSi On Glass Mask (OMOG). Process window comparisons will be evaluated on both mask technologies for all of the resist processes. In addition to the test masks, G450C completed the design of a three layer mask set with resist based Optical Proximity Correction (OPC) modeling and gathered “on product” CDU performance on a Back End Of Line (BEOL) metal stack.

Paper Details

Date Published: 24 March 2017
PDF: 17 pages
Proc. SPIE 10147, Optical Microlithography XXX, 101471B (24 March 2017); doi: 10.1117/12.2257642
Show Author Affiliations
Christopher R. Carr, Global 450mm Consortium (United States)
Hsin-Hui Huang, Global 450mm Consortium (United States)
HyoungKook Kim, Global 450mm Consortium (United States)
Shannon Dunn, Global 450mm Consortium (United States)
Jasper P. Munson, Nikon Precision Inc. (United States)
Russell A. Black, Nikon Precision Inc. (United States)
Preston A. Crupe, SCREEN SPE USA, LLC (United States)
Victor A. Perez, SCREEN SPE USA, LLC (United States)
Takuya Kuroda, SCREEN SPE USA, LLC (United States)

Published in SPIE Proceedings Vol. 10147:
Optical Microlithography XXX
Andreas Erdmann; Jongwook Kye, Editor(s)

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