Share Email Print

Proceedings Paper

Litho hotspots fixing using model based algorithm
Author(s): Meili Zhang; Shirui Yu; Zhibiao Mao; Marwa Shafee; Kareem Madkour; Wael ElManhawy; Joe Kwan; Xinyi Hu; Qijian Wan; Chunshan Du
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

As technology advances, IC designs are getting more sophisticated, thus it becomes more critical and challenging to fix printability issues in the design flow. Running lithography checks before tapeout is now mandatory for designers, which creates a need for more advanced and easy-to-use techniques for fixing hotspots found after lithographic simulation without creating a new design rule checking (DRC) violation or generating a new hotspot. This paper presents a new methodology for fixing hotspots on layouts while using the same engine currently used to detect the hotspots. The fix is achieved by applying minimum movement of edges causing the hotspot, with consideration of DRC constraints. The fix is internally simulated by the lithographic simulation engine to verify that the hotspot is eliminated and that no new hotspot is generated by the new edge locations. Hotspot fix checking is enhanced by adding DRC checks to the litho-friendly design (LFD) rule file to guarantee that any fix options that violate DRC checks are removed from the output hint file. This extra checking eliminates the need to re-run both DRC and LFD checks to ensure the change successfully fixed the hotspot, which saves time and simplifies the designer’s workflow. This methodology is demonstrated on industrial designs, where the fixing rate of single and dual layer hotspots is reported.

Paper Details

Date Published: 4 April 2017
PDF: 6 pages
Proc. SPIE 10148, Design-Process-Technology Co-optimization for Manufacturability XI, 101481B (4 April 2017); doi: 10.1117/12.2257630
Show Author Affiliations
Meili Zhang, Shanghai Huali Microelectronics Corp. (China)
Shirui Yu, Shanghai Huali Microelectronics Corp. (China)
Zhibiao Mao, Shanghai Huali Microelectronics Corp. (China)
Marwa Shafee, Mentor Graphics Egypt (Egypt)
Kareem Madkour, Mentor Graphics Egypt (Egypt)
Wael ElManhawy, Mentor Graphics Corp. (United States)
Joe Kwan, Mentor Graphics Corp. (United States)
Xinyi Hu, Mentor Graphics Shanghai Electronic Technology Co. (China)
Qijian Wan, Mentor Graphics Shanghai Electronic Technology Co. (China)
Chunshan Du, Mentor Graphics Shanghai Electronic Technology Co. (China)

Published in SPIE Proceedings Vol. 10148:
Design-Process-Technology Co-optimization for Manufacturability XI
Luigi Capodieci; Jason P. Cain, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?