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Proceedings Paper

Improved image quality of digital lithography using modified particle swarm optimization algorithm
Author(s): Liang Zhang; ZhaoJun Shi; Qishen Li
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Paper Abstract

Image distortion problem is key issue in DMD digital lithography system, in this paper, quality optimization algorithm of digital lithography based on improved particle swarm optimization algorithm is proposed. The fidelity is adopted as the fitness function. The pixels in the mask pattern are used as particles, and then optimization is implemented by updating the velocities and positions of these particles. Two different graphs are used to verify the method, image quality optimization of the standard particle swarm optimization algorithm and the steepest descent gradient descent algorithm, the pattern errors are reduced by 95.48%, 91.95% and 92.78%, 87.28%, respectively. The quality of image is improved, and the convergence speed is faster.

Paper Details

Date Published: 28 February 2017
PDF: 7 pages
Proc. SPIE 10256, Second International Conference on Photonics and Optical Engineering, 102562J (28 February 2017); doi: 10.1117/12.2257457
Show Author Affiliations
Liang Zhang, Nanchang Hangkong Univ. (China)
ZhaoJun Shi, Nanchang Hangkong Univ. (China)
Qishen Li, Nanchang Hangkong Univ. (China)

Published in SPIE Proceedings Vol. 10256:
Second International Conference on Photonics and Optical Engineering
Chunmin Zhang; Anand Asundi, Editor(s)

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