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Proceedings Paper

Freeform metrology using subaperture stitching interferometry
Author(s): Chris Supranowitz; Jean-Pierre Lormeau; Chris Maloney; Paul Murphy; Paul Dumas
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Paper Abstract

As applications for freeform optics continue to grow, the need for high-precision metrology is becoming more of a necessity. Currently, coordinate measuring machines (CMM) that implement touch probes or optical probes can measure the widest ranges of shapes of freeform optics, but these measurement solutions often lack sufficient lateral resolution and accuracy. Subaperture stitching interferometry (SSI™) extends traditional Fizeau interferometry to provide accurate, high-resolution measurements of flats, spheres, and aspheres, and development is currently on-going to enable measurements of freeform surfaces. We will present recent freeform metrology results, including repeatability and cross-test data. We will also present MRF® polishing results where the stitched data was used as the input “hitmap” to the deterministic polishing process.

Paper Details

Date Published: 11 November 2016
PDF: 12 pages
Proc. SPIE 10151, Optics and Measurement International Conference 2016, 101510D (11 November 2016); doi: 10.1117/12.2257279
Show Author Affiliations
Chris Supranowitz, QED Technologies, Inc. (United States)
Jean-Pierre Lormeau, QED Technologies, Inc. (United States)
Chris Maloney, QED Technologies, Inc. (United States)
Paul Murphy, QED Technologies, Inc. (United States)
Paul Dumas, QED Technologies, Inc. (United States)

Published in SPIE Proceedings Vol. 10151:
Optics and Measurement International Conference 2016
Jana Kovacicinova, Editor(s)

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