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Proceedings Paper

Fizeau simultaneous phase-shifting interferometry based on extended source
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Paper Abstract

Coaxial Fizeau simultaneous phase-shifting interferometer plays an important role in many fields for its characteristics of long optical path, miniaturization, and elimination of reference surface high-frequency error. Based on the matching of coherence between extended source and interferometer, orthogonal polarization reference wave and measurement wave can be obtained by Fizeau interferometry with Michelson interferometer preposed. Through matching spatial coherence length between preposed interferometer and primary interferometer, high contrast interference fringes can be obtained and additional interference fringes can be eliminated. Thus, the problem of separation of measurement and reference surface in the common optical path Fizeau interferometer is solved. Numerical simulation and principle experiment is conducted to verify the feasibility of extended source interferometer. Simulation platform is established by using the communication technique of DDE (dynamic data exchange) to connect Zemax and Matlab. The modeling of the extended source interferometer is realized by using Zemax. Matlab codes are programmed to automatically rectify the field parameters of the optical system and conveniently calculate the visibility of interference fringes. Combined with the simulation, the experimental platform of the extended source interferometer is established. After experimental research on the influence law of scattering screen granularity to interference fringes, the granularity of scattering screen is determined. Based on the simulation platform and experimental platform, the impacts on phase measurement accuracy of the imaging system aberration and collimation system aberration of the interferometer are analyzed. Compared the visibility relation curves between experimental measurement and simulation result, the experimental result is in line with the theoretical result.

Paper Details

Date Published: 27 September 2016
PDF: 5 pages
Proc. SPIE 9684, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test, Measurement Technology, and Equipment, 968437 (27 September 2016);
Show Author Affiliations
Shanshan Wang, Beijing Institute of Technology (China)
Qiudong Zhu, Beijing Institute of Technology (China)
Yinlong Hou, Beijing Institute of Technology (China)
Zheng Cao, Beijing Institute of Technology (China)


Published in SPIE Proceedings Vol. 9684:
8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test, Measurement Technology, and Equipment
Yudong Zhang; Fan Wu; Ming Xu; Sandy To, Editor(s)

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