Share Email Print

Proceedings Paper

Power and pulse energy scaling for high-volume UV-laser microprocessing
Author(s): Ralph Delmdahl; Oliver Haupt; Igor Bragin; Hans-Stephan Albrecht
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

In industrial laser micro processing, throughput is as important as process quality. Treating large areas in minimum time is pivotal in achieving reduced unit costs in high-volume production. Excimer lasers meet the requirements for clean and precise structuring and enable the smallest structures in an efficient way. The latest technical developments in high power excimer lasers is bound to take cost-efficient UV-laser micro processing to the next level and bridges the gap between achievable precision and achievable throughput. New excimer laser developments and beam concepts together with latest performance data for upscaling both UV power and UV pulse energy will be the topic of this paper against the background of upcoming market trends and high volume applications.

Paper Details

Date Published: 17 February 2017
PDF: 6 pages
Proc. SPIE 10092, Laser-based Micro- and Nanoprocessing XI, 1009215 (17 February 2017); doi: 10.1117/12.2256018
Show Author Affiliations
Ralph Delmdahl, Coherent LaserSystems GmbH & Co. KG (Germany)
Oliver Haupt, Coherent LaserSystems GmbH & Co. KG (Germany)
Igor Bragin, Coherent LaserSystems GmbH & Co. KG (Germany)
Hans-Stephan Albrecht, Coherent LaserSystems GmbH & Co. KG (Germany)

Published in SPIE Proceedings Vol. 10092:
Laser-based Micro- and Nanoprocessing XI
Udo Klotzbach; Kunihiko Washio; Rainer Kling, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?