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Proceedings Paper

Chemically amplified i-line positive resist for next-generation flat panel display
Author(s): Hsing-Chieh Lee; Ying-Hao Lu; Shin-Yih Huang; Wei-Jen Lan; Makoto Hanabata
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Paper Abstract

Traditional diazonaphthoquinone (DNQ) positive photoresists are widely used for TFT-LCD array process. Current LTPS technology has more than 600ppi resolution is required for small or middle-sized TFT liquid crystal display panels. One of the ways to enhance resolution is to apply i-line single exposure system instead of traditional g/h/ibroadband exposure system. We have been developing i-line chemically amplified photoresist ECA 200 series for the next generation flat panel display (FPD). ECA 200 consists of three components: a phenol resin, a photo acid generator and dissolution enhancer. We applied two different types of dissolution enhancers with two different kinds of protected groups to our resist materials. As a result, we achieved higher sensitivity, higher resolution, less footing of the resist profile and reduced standing wave effect compared with traditional DNQ photoresists. In addition, we have found further property of photoresist that does not need post exposure bake (PEB) process. This resist has a great advantage at most of current panel plants without PEB process.

Paper Details

Date Published: 27 March 2017
PDF: 6 pages
Proc. SPIE 10146, Advances in Patterning Materials and Processes XXXIV, 101461G (27 March 2017); doi: 10.1117/12.2255875
Show Author Affiliations
Hsing-Chieh Lee, Everlight Chemical Industrial Corp. (Taiwan)
Ying-Hao Lu, Everlight Chemical Industrial Corp. (Taiwan)
Shin-Yih Huang, Everlight Chemical Industrial Corp. (Taiwan)
Wei-Jen Lan, Everlight Chemical Industrial Corp. (Taiwan)
Makoto Hanabata, Toyama Prefectural Univ. (Taiwan)

Published in SPIE Proceedings Vol. 10146:
Advances in Patterning Materials and Processes XXXIV
Christoph K. Hohle, Editor(s)

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