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Proceedings Paper

Novel seamless origination and tooling approaches for film imprinting technologies
Author(s): Jörg Mick; Volkmar Boerner; Christoph Stöver; Thomas Ruhl; Philip Mück; Oliver Humbach
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Paper Abstract

There is a substantial demand for micro- and nanostructured surfaces in a large variety of industrial applications. Structured films in displays or light guiding plates for new types of luminaires are only a small but significant selection of potential fields of applications. To finally succeed in integrating a structured surface into a device, ideally the complete process chain is under control, starting with optical design, followed by origination and tooling and finally ending in mass replication technologies. In this work, the origination of micro- and nanostructures with interference lithography on very large formats is described. Also tooling and mass replication processes will be discussed within this paper in order to point out the closed process chain. However, all flat surface processes consequently result in structured films with at least one seamline. In terms of economic efficiency, many industrial sectors using micro- and nano-patterns wish to get rid of any kinds of seams in order to reduce the offcut in film production. We have developed an approach to transfer flat surface processes onto curved, convex surfaces without any seamlines, and to copy those structures into durable nickel sleeves for film production. Both technologies, seamless origination of patterns directly on cylindrical drums as well as cylindrical tooling capabilities are essential to fabricate films without any seamline. All new approaches will be presented within this paper.

Paper Details

Date Published: 20 February 2017
PDF: 10 pages
Proc. SPIE 10115, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics X, 101150U (20 February 2017); doi: 10.1117/12.2252831
Show Author Affiliations
Jörg Mick, temicon GmbH (Germany)
Volkmar Boerner, temicon GmbH (Germany)
Christoph Stöver, temicon GmbH (Germany)
Thomas Ruhl, temicon GmbH (Germany)
Philip Mück, temicon GmbH (Germany)
Oliver Humbach, temicon GmbH (Germany)

Published in SPIE Proceedings Vol. 10115:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics X
Georg von Freymann; Winston V. Schoenfeld; Raymond C. Rumpf, Editor(s)

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