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Proceedings Paper • Open Access

Elastomeric phase masks and transfer stamps: fabrication methods for micro/nano optical systems (Conference Presentation)
Author(s): John A. Rogers

Paper Abstract

Research over the last decade has led to the emergence of several powerful methods for micro/nanofabrication, with direct relevance to optics and optoelectronic systems. This talk summarizes some of our contributions to this field, through the development techniques that use (1) conformal phase masks for photodefining 3D structures with applications in photonic crystals, (2) rubber transfer stamps for integrating inorganic semiconductor materials on plastic substrates for solid state lighting, emissive displays and efficient photovoltaics, and (3) stretchable assembly platforms for controlled transformation of 2D precursor structures into well-defined, complex 3D architectures for optical MEMS. In each case, we review the basic operating principles and provide some examples of enabled applications in optics and optoelectronics.

Paper Details

Date Published: 28 April 2017
PDF: 1 pages
Proc. SPIE 10115, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics X, 101150F (28 April 2017); doi: 10.1117/12.2249802
Show Author Affiliations
John A. Rogers, Univ. of Illinois at Urbana-Champaign (United States)

Published in SPIE Proceedings Vol. 10115:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics X
Georg von Freymann; Winston V. Schoenfeld; Raymond C. Rumpf, Editor(s)

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