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Proceedings Paper

Mask manufacturing of advanced technology designs using multi-beam lithography (Part 1)
Author(s): Michael Green; Young Ham; Brian Dillon; Bryan Kasprowicz; Ik Boum Hur; Joong Hee Park; Yohan Choi; Jeff McMurran; Henry Kamberian; Daniel Chalom; Jan Klikovits; Michal Jurkovic; Peter Hudek
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Paper Abstract

As optical lithography is extended into 10nm and below nodes, advanced designs are becoming a key challenge for mask manufacturers. Techniques including advanced Optical Proximity Correction (OPC) and Inverse Lithography Technology (ILT) result in structures that pose a range of issues across the mask manufacturing process. Among the new challenges are continued shrinking Sub-Resolution Assist Features (SRAFs), curvilinear SRAFs, and other complex mask geometries that are counter-intuitive relative to the desired wafer pattern. Considerable capability improvements over current mask making methods are necessary to meet the new requirements particularly regarding minimum feature resolution and pattern fidelity. Advanced processes using the IMS Multi-beam Mask Writer (MBMW) are feasible solutions to these coming challenges. In this paper, we study one such process, characterizing mask manufacturing capability of 10nm and below structures with particular focus on minimum resolution and pattern fidelity.

Paper Details

Date Published: 20 October 2016
PDF: 10 pages
Proc. SPIE 10032, 32nd European Mask and Lithography Conference, 1003205 (20 October 2016); doi: 10.1117/12.2247941
Show Author Affiliations
Michael Green, Photronics Inc. (United States)
Young Ham, Photronics Inc. (United States)
Brian Dillon, Photronics Inc. (United States)
Bryan Kasprowicz, Photronics Inc. (United States)
Ik Boum Hur, Photronics Inc. (United States)
Joong Hee Park, Photronics Inc. (United States)
Yohan Choi, Photronics Inc. (United States)
Jeff McMurran, Photronics Inc. (United States)
Henry Kamberian, Photronics Inc. (United States)
Daniel Chalom, IMS Nanofabrication AG (Austria)
Jan Klikovits, IMS Nanofabrication AG (Austria)
Michal Jurkovic, IMS Nanofabrication AG (Austria)
Peter Hudek, IMS Nanofabrication AG (Austria)

Published in SPIE Proceedings Vol. 10032:
32nd European Mask and Lithography Conference
Uwe F.W. Behringer; Jo Finders, Editor(s)

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