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Proceedings Paper

Effect of cutting temperature on hardness of SiC and diamond in the nano-cutting process of monocrystalline silicon
Author(s): Jiachun Wang; Yuntao Li; Xiaoxuan Liu; Maoqiang Lv
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Paper Abstract

In the process of cutting silicon by natural diamond tools, groove wear happens on the flank face of cutting tool frequently.Scholars believe that one of the wear reasons is mechanical scratching effect by hard particles like SiC. To reveal the mechanical scratching mechanism, it is essential to study changes in the mechanical properties of hard particles and diamond, especially the effect of cutting temperature on hardness of diamond and hard particles. Molecular dynamics (MD) model that contact-zone temperature between tool and workpiece was calculated by dividing zone while nano-cutting monocrystalline silicon was established, cutting temperature values in different regions were computed as the simulation was carried out.On this basis, the models of molecular dynamics simulation of SiC and diamond were established separately with setting the initial temperature to room temperature. The laws of length change of C-C bond and Si-C bond varing with increase of simulation temperature were studied. And drawing on predecessors' research on theoretical calculation of hardness of covalent crystals and the relationship between crystal valence electron density and bond length, the curves that the hardness of diamond and SiC varing with bond length were obtained. The effect of temperature on the hardness was calculated. Results show that, local cutting temperature can reach 1300K.The rise in cutting temperature leaded to a decrease in the diamond local atomic clusters hardness,SiC local atomic clusters hardness increased. As the cutting temperature was more than 1100K,diamond began to soften, the local clusters hardness was less than that of SiC.

Paper Details

Date Published: 19 October 2016
PDF: 7 pages
Proc. SPIE 10154, Advanced Optical Design and Manufacturing Technology and Astronomical Telescopes and Instrumentation, 101541J (19 October 2016); doi: 10.1117/12.2246934
Show Author Affiliations
Jiachun Wang, Yanshan Univ. (China)
Yuntao Li, Yanshan Univ. (China)
Xiaoxuan Liu, Yanshan Univ. (China)
Maoqiang Lv, Yanshan Univ. (China)

Published in SPIE Proceedings Vol. 10154:
Advanced Optical Design and Manufacturing Technology and Astronomical Telescopes and Instrumentation
Min Xu; Ji Yang, Editor(s)

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