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Proceedings Paper

Uncertainty evaluation of ellipsometer: from instrumentation to material and application in Avogadro's project
Author(s): Wende Liu; Chi Chen; Qiming Fan; Chu Chu
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Paper Abstract

As directly acquired by ellipsometer, the ellipsometric angles obtain their uncertainties from the instrument. As a metrological tool, one is interest in the derived parameters from the ellipsometric angles, therefore acquiring uncertainties from both instrument and material. As the relative variation of parameters are of interest, ellipsometers are very sensitive and precise. However, for extracting absolute values, calibration by independent method is necessary to elliminate the uncertaintie from the instrument and material. A framework for evaluating the uncertainties from the instrument related parameters, such as the wavelength, bandwidth, the angle of incidence, is given in this work. The framework could facilitate the use of ellipsometer for general measurement of various thin films other than limited type of films like SiO2 or SiNx on Si. For evaluating material related parameters, a typical application in the characterization of surface of silicon sphere is investigated by carefully investigating into the optical constants of sublayers.

Paper Details

Date Published: 24 November 2016
PDF: 8 pages
Proc. SPIE 10023, Optical Metrology and Inspection for Industrial Applications IV, 100231Y (24 November 2016); doi: 10.1117/12.2246391
Show Author Affiliations
Wende Liu, National Institute of Metrology (China)
Chi Chen, National Institute of Metrology (China)
Qiming Fan, National Institute of Metrology (China)
Chu Chu, National Institute of Metrology (China)

Published in SPIE Proceedings Vol. 10023:
Optical Metrology and Inspection for Industrial Applications IV
Sen Han; Toru Yoshizawa; Song Zhang, Editor(s)

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