
Proceedings Paper
Non-null compensator design method in digital Moiré interferometry for freeform surface measurementFormat | Member Price | Non-Member Price |
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Paper Abstract
High accuracy interferometric testing for freeform optics surface has always been a great challenge because of its arbitrary form. Our group proposed a Digital Moiré Interferometric Technique (DMIT) based on partial compensator (PC) for aspheric surface testing since the year 2003. But the PC design method for non-rotational symmetric freeform surface is still a challenge. In this paper, we propose a PC design method for non-null freeform surface measurement. The PC generates non-rotational symmetry aberration by off axis and rotation round axis. Later the design criterion of PC is also analyzed. Finally an off-axis aspheric surface was measured in the simulation experiment, and the error of PV and RMS is 0.0053λ and 0.0498λ theoretically. Experimental results indicate that the designed PC is able to be utilized in freeform surface measurement.
Paper Details
Date Published: 27 September 2016
PDF: 6 pages
Proc. SPIE 9684, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test, Measurement Technology, and Equipment, 96843G (27 September 2016); doi: 10.1117/12.2245286
Published in SPIE Proceedings Vol. 9684:
8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test, Measurement Technology, and Equipment
Yudong Zhang; Fan Wu; Ming Xu; Sandy To, Editor(s)
PDF: 6 pages
Proc. SPIE 9684, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test, Measurement Technology, and Equipment, 96843G (27 September 2016); doi: 10.1117/12.2245286
Show Author Affiliations
Qun Hao, Beijing Institute of Technology (China)
Shaopu Wang, Beijing Institute of Technology (China)
Shaopu Wang, Beijing Institute of Technology (China)
Yao Hu, Beijing Institute of Technology (China)
Published in SPIE Proceedings Vol. 9684:
8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test, Measurement Technology, and Equipment
Yudong Zhang; Fan Wu; Ming Xu; Sandy To, Editor(s)
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