Proceedings Paper
MBMW-101: World's 1st high-throughput multi-beam mask writer| Format | Member Price | Non-Member Price |
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Paper Abstract
The world’s first high throughput multi-beam mask writers (MBMW) have been realized by upgrading the existing MBMW Alpha and Beta tools with a 10x faster data path. In these tools a multi-beam column provides 262-thousand programmable beams of 20nm beam size. The current density is adjustable up to 1 A/cm2, resulting in a total beam current of up to 1 μA. With the upgraded 120 Gbps data path full field 7nm node layouts can be printed in less than 10 hours. This upgrade completes IMS’ first generation of multi-beam mask writers, which is called MBMW-101 and is meeting the requirements of the 7nm technology node.
Paper Details
Date Published: 25 October 2016
PDF: 7 pages
Proc. SPIE 9985, Photomask Technology 2016, 998505 (25 October 2016); doi: 10.1117/12.2243638
Published in SPIE Proceedings Vol. 9985:
Photomask Technology 2016
Bryan S. Kasprowicz; Peter D. Buck, Editor(s)
PDF: 7 pages
Proc. SPIE 9985, Photomask Technology 2016, 998505 (25 October 2016); doi: 10.1117/12.2243638
Show Author Affiliations
Christof Klein, IMS Nanofabrication AG (Austria)
Elmar Platzgummer, IMS Nanofabrication AG (Austria)
Published in SPIE Proceedings Vol. 9985:
Photomask Technology 2016
Bryan S. Kasprowicz; Peter D. Buck, Editor(s)
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