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Proceedings Paper

Technological studies for plasmonic metasurfaces
Author(s): Roxana Tomescu; Cristian Kusko; Adrian Dinescu; Bogdan Bita; Marian Popescu
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Paper Abstract

This work will present the technological processes necessary to experimentally obtain plasmonic metasurfaces for developing flat optical components or diffractive optical elements (DOE) which have reflexion functionalities. This class of metasurfaces offers the possibility to manipulate the beam shape using an array of metallic nanoscale elements patterned on a substrate.

The main feature of these structures is that one can manipulate the phase behavior by modifying some of the geometrical parameters of the nano-antennas in order to achieve the required phase shift values for the desired applications. The first important step in experimentally obtaining a plasmonic metasurface structures is the electron beam lithography (EBL) followed by the lift-off method. Due to the small sizes of the gold nano-antennas and tight periodicity of the array a number of impediments can emerge in experimentally obtaining such geometries which can be overcome by the parameter optimization of the employed technologies.

Paper Details

Date Published: 14 December 2016
PDF: 6 pages
Proc. SPIE 10010, Advanced Topics in Optoelectronics, Microelectronics, and Nanotechnologies VIII, 100101U (14 December 2016); doi: 10.1117/12.2243293
Show Author Affiliations
Roxana Tomescu, IMT Bucharest (Romania)
Univ. Politehnica of Bucharest (Romania)
Cristian Kusko, IMT Bucharest (Romania)
Adrian Dinescu, IMT Bucharest (Romania)
Bogdan Bita, IMT Bucharest (Romania)
Univ. of Bucharest (Romania)
Marian Popescu, IMT Bucharest (Romania)

Published in SPIE Proceedings Vol. 10010:
Advanced Topics in Optoelectronics, Microelectronics, and Nanotechnologies VIII
Marian Vladescu; Cornel T. Panait; Razvan Tamas; George Caruntu; Ionica Cristea, Editor(s)

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