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Proceedings Paper

OPC care-area feedforwarding to MPC
Author(s): Brian Dillon; Yi-Hsing Peng; Masakazu Hamaji; Dai Tsunoda; Tomoyuki Muramatsu; Shuichiro Ohara; Yi Zou; Vincent Arnoux; Stanislas Baron; Xiaolong Zhang
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Paper Abstract

Demand for mask process correction (MPC) is growing for leading-edge process nodes. MPC was originally intended to correct CD linearity for narrow assist features difficult to resolve on a photomask without any correction, but it has been extended to main features as process nodes have been shrinking. As past papers have observed, MPC shows improvements in photomask fidelity. Using advanced shape and dose corrections could give more improvements, especially at line-ends and corners. However, there is a dilemma on using such advanced corrections on full mask level because it increases data volume and run time. In addition, write time on variable shaped beam (VSB) writers also increases as the number of shots increases. Optical proximity correction (OPC) care-area defines circuit design locations that require high mask fidelity under mask writing process variations such as energy fluctuation. It is useful for MPC to switch its correction strategy and permit the use of advanced mask correction techniques in those local care-areas where they provide maximum wafer benefits. The use of mask correction techniques tailored to localized post-OPC design can result in similar desired level of data volume, run time, and write time. ASML Brion and NCS have jointly developed a method to feedforward the care-area information from Tachyon LMC to NDE-MPC to provide real benefit for improving both mask writing and wafer printing quality. This paper explains the detail of OPC care-area feedforwarding to MPC between ASML Brion and NCS, and shows the results. In addition, improvements on mask and wafer simulations are also shown. The results indicate that the worst process variation (PV) bands are reduced up to 37% for a 10nm tech node metal case.

Paper Details

Date Published: 4 October 2016
PDF: 11 pages
Proc. SPIE 9985, Photomask Technology 2016, 99851A (4 October 2016); doi: 10.1117/12.2242972
Show Author Affiliations
Brian Dillon, Nippon Control System Corp. (Japan)
Yi-Hsing Peng, ASML US, Inc. (United States)
Masakazu Hamaji, Nippon Control System Corp. (Japan)
Dai Tsunoda, Nippon Control System Corp. (Japan)
Tomoyuki Muramatsu, Nippon Control System Corp. (Japan)
Shuichiro Ohara, Nippon Control System Corp. (Japan)
Yi Zou, ASML US, Inc. (United States)
Vincent Arnoux, ASML US, Inc. (United States)
Stanislas Baron, ASML US, Inc. (United States)
Xiaolong Zhang, ASML US, Inc. (United States)

Published in SPIE Proceedings Vol. 9985:
Photomask Technology 2016
Bryan S. Kasprowicz; Peter D. Buck, Editor(s)

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