
Proceedings Paper
Development of actual EUV mask observation method for micro coherent EUV scatterometry microscopeFormat | Member Price | Non-Member Price |
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Paper Abstract
To review phase and amplitude defect on extreme ultraviolet (EUV) mask with EUV intensity and phase contrast, we
have developed the micro coherent EUV scatterometry microscope (micro-CSM). A coherent EUV beam was focused on
a defect using a Fresnel zoneplate, where the illumination size was 140 nm diameter. Diffraction from the defect was
captured by an EUV CCD camera directly. The diffraction signal was depended on the zoneplate focus, where the defect
signal was efficiently detected at a best focus position. To review an actual EUV mask that has no focus-alignment
pattern on surface, we developed a focusing method using a speckle signal.
Paper Details
Date Published: 25 October 2016
PDF: 6 pages
Proc. SPIE 9985, Photomask Technology 2016, 99851T (25 October 2016); doi: 10.1117/12.2242809
Published in SPIE Proceedings Vol. 9985:
Photomask Technology 2016
Bryan S. Kasprowicz; Peter D. Buck, Editor(s)
PDF: 6 pages
Proc. SPIE 9985, Photomask Technology 2016, 99851T (25 October 2016); doi: 10.1117/12.2242809
Show Author Affiliations
T. Watanabe, Univ. of Hyogo (Japan)
Published in SPIE Proceedings Vol. 9985:
Photomask Technology 2016
Bryan S. Kasprowicz; Peter D. Buck, Editor(s)
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