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Proceedings Paper

Source emission pattern polynomial representation
Author(s): Ricardo Flores-Hernandez; Francisco De Villa
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Paper Abstract

A method to obtain accurate thickness data to characterize the emission patterns of evaporation sources is described. Thickness data is obtained through digital image processing algorithms applied to the monochromatic transmission bands digitized from a set of multilayer Fabry-Perot filters deposited on large flat circular substrates. These computer image-processed taper-thickness patterns are reduced to orthonormal polynomial series expansions in two steps, using Tschebyshev and associated Legendre polynomials. The circular glass substrates employed to characterize each type of evaporation source are kept stationary during the evaporation process of evaporation of each layer to obtain the specific thickness distribution for each type of source.

Paper Details

Date Published: 1 December 1990
PDF: 11 pages
Proc. SPIE 1324, Modeling of Optical Thin Films II, (1 December 1990); doi: 10.1117/12.22415
Show Author Affiliations
Ricardo Flores-Hernandez, Centro de Investigaciones en Optica (Mexico)
Francisco De Villa, Centro de Investigaciones en Optica (Mexico)

Published in SPIE Proceedings Vol. 1324:
Modeling of Optical Thin Films II
Michael Ray Jacobson, Editor(s)

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