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Proceedings Paper

Development of a novel closed EUV pellicle for EUVL manufacturing
Author(s): Yosuke Ono; Kazuo Kohmura; Atsushi Okubo; Daiki Taneichi; Hisako Ishikawa; Tsuneaki Biyajima
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Paper Abstract

As for the EUV pellicle, closed pellicle structure with the filters which has fundamentally no penetration path of particles is needed to keep the clean reliability level of photomask equivalent to the current photolithography. We proposed a novel closed EUV pellicle equipped with filters which has not only the particle intrusion prevention but also the ventilation performance. Full-size closed EUV pellicle was fabricated by forming the vent holes in the Si border part and putting the wide filters on the top side of Si border. As the result, we experimentally confirmed the suppression of the membrane deflection under the practical pumping down condition.

Paper Details

Date Published: 26 September 2016
PDF: 7 pages
Proc. SPIE 9985, Photomask Technology 2016, 99850B (26 September 2016); doi: 10.1117/12.2241393
Show Author Affiliations
Yosuke Ono, Mitsui Chemicals, Inc. (Japan)
Kazuo Kohmura, Mitsui Chemicals, Inc. (Japan)
Atsushi Okubo, Mitsui Chemicals, Inc. (Japan)
Daiki Taneichi, Mitsui Chemicals, Inc. (Japan)
Hisako Ishikawa, Mitsui Chemicals, Inc. (Japan)
Tsuneaki Biyajima, Mitsui Chemicals, Inc. (Japan)

Published in SPIE Proceedings Vol. 9985:
Photomask Technology 2016
Bryan S. Kasprowicz; Peter D. Buck, Editor(s)

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