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Proceedings Paper

Prototyping 9-inch size PSM mask blanks for 450mm wafer process (2016)
Author(s): Noriyuki Harashima; Hiroyuki Iso; Tatsuya Chishima
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Paper Abstract

6-inch size (known as 6025QZ) binary Cr mask is widely used in the semiconductor lithography for over 20years. Recently for the 450mm wafer process, high grade 9-inch size mask is expected. For this application, we have studied and developed prototyping 9-inch size PSM KrF and ArF mask blanks. This time we will explain these PSM mask blanks status.

Paper Details

Date Published: 4 October 2016
PDF: 4 pages
Proc. SPIE 9985, Photomask Technology 2016, 99851H (4 October 2016); doi: 10.1117/12.2241378
Show Author Affiliations
Noriyuki Harashima, ULVAC Coating Corp. (Japan)
Hiroyuki Iso, ULVAC Coating Corp. (Japan)
Tatsuya Chishima, ULVAC Coating Corp. (Japan)

Published in SPIE Proceedings Vol. 9985:
Photomask Technology 2016
Bryan S. Kasprowicz; Peter D. Buck, Editor(s)

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