The ever increasing pattern densities and design complexities make the tuning of optical proximity correction (OPC) recipes more challenging. There are various recipe tuning methods to meet the challenge, such as genetic algorithm (GA), simulated annealing, and OPC software vendor provided recipe optimizers. However, these methodologies usually only consider edge placement errors (EPEs). Therefore, these techniques may not provide adequate freedom to solve unique problems at special geometries, for example bridge, pinch, and process variation band related violations at complex 2D geometries. This paper introduces a general methodology to fix specific problems identified at the OPC verification stage and demonstrates its successful application to two test-cases. The algorithm and method of the automatic scoring system is introduced in order to identify and prioritize the problems that need to be fixed based on severity, with the POR recipe score used as the baseline reference. A GA optimizer, whose objective function is based on the scoring system, is applied to tune the OPC recipe parameters to optimum condition after generations of selections. The GA optimized recipe would be compared to existing recipe to quantify the amount of improvement. This technique was subsequently applied to eliminate certain chronic OPC verification problems which were encountered in the past. Though the benefits have been demonstrated for limited test cases, employing this technique more universally will enable users to efficiently reduce the number of OPC verification violations and provide robust OPC solutions.

Date Published: 5 October 2016
PDF: 10 pages
Proc. SPIE 9985, Photomask Technology 2016, 998525 (5 October 2016); doi: 10.1117/12.2241178

Published in SPIE Proceedings Vol. 9985:
Photomask Technology 2016
Bryan S. Kasprowicz; Peter D. Buck, Editor(s)