
Proceedings Paper
Megasonic cleaning strategy for sub-10nm photomasksFormat | Member Price | Non-Member Price |
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Paper Abstract
One of the main challenges in photomask cleaning is balancing particle removal efficiency (PRE) with pattern
damage control. To overcome this challenge, a high frequency megasonic cleaning strategy is implemented.
Apart from megasonic frequency and power, photomask surface conditioning also influences cleaning
performance. With improved wettability, cleanliness is enhanced while pattern damage risk is simultaneously
reduced. Therefore, a particle removal process based on higher megasonic frequencies, combined with proper
surface pre-treatment, provides improved cleanliness without the unintended side effects of pattern damage, thus
supporting the extension of megasonic cleaning technology into 10nm half pitch (hp) device node and beyond.
Paper Details
Date Published: 4 October 2016
PDF: 7 pages
Proc. SPIE 9985, Photomask Technology 2016, 998515 (4 October 2016); doi: 10.1117/12.2241143
Published in SPIE Proceedings Vol. 9985:
Photomask Technology 2016
Bryan S. Kasprowicz; Peter D. Buck, Editor(s)
PDF: 7 pages
Proc. SPIE 9985, Photomask Technology 2016, 998515 (4 October 2016); doi: 10.1117/12.2241143
Show Author Affiliations
Jyh-Wei Hsu, SUSS MicroTec Inc. (Taiwan)
Martin Samayoa, SUSS MicroTec Inc. (United States)
Peter Dress, SUSS MicroTec Photomask Equipment (Germany)
Uwe Dietze, SUSS MicroTec Inc. (United States)
Ai-Jay Ma, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
Martin Samayoa, SUSS MicroTec Inc. (United States)
Peter Dress, SUSS MicroTec Photomask Equipment (Germany)
Uwe Dietze, SUSS MicroTec Inc. (United States)
Ai-Jay Ma, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
Chia-Shih Lin, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
Rick Lai, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
Peter Chang, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
Laurent Tuo, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
Rick Lai, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
Peter Chang, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
Laurent Tuo, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
Published in SPIE Proceedings Vol. 9985:
Photomask Technology 2016
Bryan S. Kasprowicz; Peter D. Buck, Editor(s)
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