Proceedings Paper
Method of monitoring nonquarter-wavelength film thickness by turning point| Format | Member Price | Non-Member Price |
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Paper Abstract
A method is presented for nionitoring Taultilayer structures
with nonquarter wavelength thickness. This method is similar to the
conventional turning point method, except that the irronitoring
wavelength selected by adniittance diagram will be changed with
layers. Results are given for the use of this method in depositing
Antireflectance coatings (ARC.)
Paper Details
Date Published: 1 December 1990
PDF: 6 pages
Proc. SPIE 1323, Optical Thin Films III: New Developments, (1 December 1990);
Published in SPIE Proceedings Vol. 1323:
Optical Thin Films III: New Developments
Richard Ian Seddon, Editor(s)
PDF: 6 pages
Proc. SPIE 1323, Optical Thin Films III: New Developments, (1 December 1990);
Show Author Affiliations
Anmin Zheng, Shanghai Institute of Technical Physics (United States)
Yixun Yan, Shanghai Institute of Technical Physics (China)
Yixun Yan, Shanghai Institute of Technical Physics (China)
Fengshan Zhang, Shanghai Institute of Technical Physics (China)
Published in SPIE Proceedings Vol. 1323:
Optical Thin Films III: New Developments
Richard Ian Seddon, Editor(s)
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