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Proceedings Paper

Fiber-optic based in situ atomic spectroscopy for manufacturing of x-ray optics
Author(s): George Atanasoff; Christopher J. Metting; Hasso von Bredow
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Paper Abstract

The manufacturing of multilayer Laue (MLL) components for X-ray optics by physical vapor deposition (PVD) requires high precision and accuracy that presents a significant process control challenge. Currently, no process control system provides the accuracy, long-term stability and broad capability for adoption in the manufacturing of X-ray optics. In situ atomic absorption spectroscopy is a promising process control solution, capable of monitoring the deposition rate and chemical composition of extremely thin metal silicide films during deposition and overcoming many limitations of the traditional methods. A novel in situ PVD process control system for the manufacturing of high-precision thin films, based on combined atomic absorption/emission spectrometry in the vicinity of the deposited substrate, is described. By monitoring the atomic concentration in the plasma region independently from the film growth on the deposited substrate, the method allows deposition control of extremely thin films, compound thin films and complex multilayer structures. It provides deposition rate and film composition measurements that can be further utilized for dynamic feedback process control. The system comprises a reconfigurable hardware module located outside the deposition chamber with hollow cathode light sources and a fiber-optic-based frame installed inside the deposition chamber. Recent experimental results from in situ monitoring of Al and Si thin films deposited by DC and RF magnetron sputtering at a variety of plasma conditions and monitoring configurations are presented. The results validate the operation of the system in the deposition of compound thin films and provide a path forward for use in manufacturing of X-Ray optics.

Paper Details

Date Published: 8 September 2016
PDF: 11 pages
Proc. SPIE 9962, Advances in Metrology for X-Ray and EUV Optics VI, 99620F (8 September 2016); doi: 10.1117/12.2240406
Show Author Affiliations
George Atanasoff, AccuStrata Inc. (United States)
Christopher J. Metting, AccuStrata Inc. (United States)
Hasso von Bredow, AccuStrata Inc. (United States)

Published in SPIE Proceedings Vol. 9962:
Advances in Metrology for X-Ray and EUV Optics VI
Lahsen Assoufid; Haruhiko Ohashi; Anand Krishna Asundi, Editor(s)

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