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Proceedings Paper

Developments in synchrotron x-ray micro-tomography for in-situ materials analysis at the Advanced Light Source
Author(s): Harold S. Barnard; A. A. MacDowell; D. Y. Parkinson; S. V. Venkatakrishnan; F. Panerai; N. N. Mansour
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Paper Abstract

The Advanced Light Source (ALS) is a third-generation synchrotron X-ray source that operates as a user facility with more than 40 beamlines hosting over 2000 users per year. Synchrotron sources like the ALS provide high quality X-ray beams, with flux that is several orders of magnitude higher than lab-based sources. This is particularly advantageous for dynamic applications because it allows for high-speed, high-resolution imaging and microscale tomography. The hard X-ray beamline 8.3.2 at the Advanced Light Source enables imaging of samples at high temperatures and pressures, with mechanical loading and other realistic conditions using environmental test cells. These test cells enable experimental observation of samples undergoing dynamic microstructural changes in-situ. We present recent instrumentation developments that allow for continuous tomography with scan rates approaching 1 Hz per 3D image. In addition, our use of iterative reconstruction techniques allows for improved image quality despite fewer images and low exposure times used during fast tomography compared to traditional Fourier reconstruction methods.

Paper Details

Date Published: 3 October 2016
PDF: 13 pages
Proc. SPIE 9967, Developments in X-Ray Tomography X, 99671H (3 October 2016); doi: 10.1117/12.2238305
Show Author Affiliations
Harold S. Barnard, Lawrence Berkeley National Lab. (United States)
A. A. MacDowell, Lawrence Berkeley National Lab. (United States)
D. Y. Parkinson, Lawrence Berkeley National Lab. (United States)
S. V. Venkatakrishnan, Lawrence Berkeley National Lab. (United States)
F. Panerai, NASA Ames Research Ctr. (United States)
N. N. Mansour, NASA Ames Research Ctr. (United States)


Published in SPIE Proceedings Vol. 9967:
Developments in X-Ray Tomography X
Stuart R. Stock; Bert Müller; Ge Wang, Editor(s)

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