
Proceedings Paper
Modeling surface topography of state-of-the-art x-ray mirrors as a result of stochastic polishing process: recent developmentsFormat | Member Price | Non-Member Price |
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Paper Abstract
Recently, an original method for the statistical modeling of surface topography of state-of-the-art mirrors for usage in xray
optical systems at light source facilities and for astronomical telescopes [Opt. Eng. 51(4), 046501, 2012; ibid. 53(8),
084102 (2014); and ibid. 55(7), 074106 (2016)] has been developed. In modeling, the mirror surface topography is
considered to be a result of a stationary uniform stochastic polishing process and the best fit time-invariant linear filter
(TILF) that optimally parameterizes, with limited number of parameters, the polishing process is determined. The TILF
model allows the surface slope profile of an optic with a newly desired specification to be reliably forecast before
fabrication. With the forecast data, representative numerical evaluations of expected performance of the prospective
mirrors in optical systems under development become possible [Opt. Eng., 54(2), 025108 (2015)]. Here, we suggest and
demonstrate an analytical approach for accounting the imperfections of the used metrology instruments, which are
described by the instrumental point spread function, in the TILF modeling. The efficacy of the approach is demonstrated
with numerical simulations for correction of measurements performed with an autocollimator based surface slope
profiler. Besides solving this major metrological problem, the results of the present work open an avenue for developing
analytical and computational tools for stitching data in the statistical domain, obtained using multiple metrology
instruments measuring significantly different bandwidths of spatial wavelengths.
Paper Details
Date Published: 8 September 2016
PDF: 17 pages
Proc. SPIE 9962, Advances in Metrology for X-Ray and EUV Optics VI, 99620G (8 September 2016); doi: 10.1117/12.2238260
Published in SPIE Proceedings Vol. 9962:
Advances in Metrology for X-Ray and EUV Optics VI
Lahsen Assoufid; Haruhiko Ohashi; Anand Krishna Asundi, Editor(s)
PDF: 17 pages
Proc. SPIE 9962, Advances in Metrology for X-Ray and EUV Optics VI, 99620G (8 September 2016); doi: 10.1117/12.2238260
Show Author Affiliations
Valeriy V. Yashchuk, Lawrence Berkeley National Lab. (United States)
Gary Centers, Lawrence Berkeley National Lab. (United States)
Gary Centers, Lawrence Berkeley National Lab. (United States)
Yuri N. Tyurin, Moscow State Univ. (Russian Federation)
Second Star Algonumerix, LLC (United States)
Anastasia Tyurina, Second Star Algonumerix, LLC (United States)
Second Star Algonumerix, LLC (United States)
Anastasia Tyurina, Second Star Algonumerix, LLC (United States)
Published in SPIE Proceedings Vol. 9962:
Advances in Metrology for X-Ray and EUV Optics VI
Lahsen Assoufid; Haruhiko Ohashi; Anand Krishna Asundi, Editor(s)
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