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Proceedings Paper

MetaMode: a new method for high-rate MetaMode reactive sputtering
Author(s): Richard Ian Seddon; Paul M. Lefebvre
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Paper Abstract

A new system has been developed.for DC reactive magnetron sputtering. This system features enhanced oxidation rates and near metallic sputtering conditions. It is particularly well adapted for coating complex multilayer films and for depositing uniform thickness films on small to moderate size planar and nonplanar substrates.

Paper Details

Date Published: 1 December 1990
PDF: 5 pages
Proc. SPIE 1323, Optical Thin Films III: New Developments, (1 December 1990); doi: 10.1117/12.22379
Show Author Affiliations
Richard Ian Seddon, Optical Coating Lab., Inc. (United States)
Paul M. Lefebvre, Optical Coating Lab., Inc. (United States)

Published in SPIE Proceedings Vol. 1323:
Optical Thin Films III: New Developments
Richard Ian Seddon, Editor(s)

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