Proceedings Paper
Structure of Ru/B4C multilayer for high-flux monochromator application| Format | Member Price | Non-Member Price |
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Paper Abstract
Multilayer monochromators are widely needed in synchrotron beamlines to provide the high photon flux as compared to
crystals. Ru/B4C multilayer is the most promising candidate working at the energy region of 10-20 keV. To develop this
multilayer monochromator for an undulator beamline with high power density, the layer structure and reflectivity of the
multilayer were studied. The deposition process for the Ru/B4C multilayers was first optimized. Multilayers with
different periods (d=2.0 nm, 3.0 nm, 4.0 nm) and single layers fo Ru and B4C were fabricated and characterized using
the grazing incidence X-ray reflectometry (GIXR). A low density of Ru in the multilayers was found as compared to the
single layers which attributed to the relatively low reflectance of 53.3% at 8.05 keV of the multilayer with 3.0 nm period.
Paper Details
Date Published: 15 September 2016
PDF: 7 pages
Proc. SPIE 9963, Advances in X-Ray/EUV Optics and Components XI, 99630H (15 September 2016); doi: 10.1117/12.2236627
Published in SPIE Proceedings Vol. 9963:
Advances in X-Ray/EUV Optics and Components XI
Ali M. Khounsary; Shunji Goto; Christian Morawe, Editor(s)
PDF: 7 pages
Proc. SPIE 9963, Advances in X-Ray/EUV Optics and Components XI, 99630H (15 September 2016); doi: 10.1117/12.2236627
Show Author Affiliations
Yang Liu, Tongji Univ. (China)
Qiushi Huang, Tongji Univ. (China)
Hui Jiang, Shanghai Institute of Applied Physics (China)
Qiushi Huang, Tongji Univ. (China)
Hui Jiang, Shanghai Institute of Applied Physics (China)
Published in SPIE Proceedings Vol. 9963:
Advances in X-Ray/EUV Optics and Components XI
Ali M. Khounsary; Shunji Goto; Christian Morawe, Editor(s)
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