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Proceedings Paper

Structure of Ru/B4C multilayer for high-flux monochromator application
Author(s): Yang Liu; Qiushi Huang; Hui Jiang; Yang Yang; Zhong Zhang; Zhanshan Wang
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Paper Abstract

Multilayer monochromators are widely needed in synchrotron beamlines to provide the high photon flux as compared to crystals. Ru/B4C multilayer is the most promising candidate working at the energy region of 10-20 keV. To develop this multilayer monochromator for an undulator beamline with high power density, the layer structure and reflectivity of the multilayer were studied. The deposition process for the Ru/B4C multilayers was first optimized. Multilayers with different periods (d=2.0 nm, 3.0 nm, 4.0 nm) and single layers fo Ru and B4C were fabricated and characterized using the grazing incidence X-ray reflectometry (GIXR). A low density of Ru in the multilayers was found as compared to the single layers which attributed to the relatively low reflectance of 53.3% at 8.05 keV of the multilayer with 3.0 nm period.

Paper Details

Date Published: 15 September 2016
PDF: 7 pages
Proc. SPIE 9963, Advances in X-Ray/EUV Optics and Components XI, 99630H (15 September 2016); doi: 10.1117/12.2236627
Show Author Affiliations
Yang Liu, Tongji Univ. (China)
Qiushi Huang, Tongji Univ. (China)
Hui Jiang, Shanghai Institute of Applied Physics (China)
Yang Yang, Tongji Univ. (China)
Zhong Zhang, Tongji Univ. (China)
Zhanshan Wang, Tongji Univ. (China)

Published in SPIE Proceedings Vol. 9963:
Advances in X-Ray/EUV Optics and Components XI
Ali M. Khounsary; Shunji Goto; Christian Morawe, Editor(s)

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