Share Email Print

Proceedings Paper

Nanomanufacturing concerns about measurements made in the SEM Part V: dealing with noise
Author(s): Michael T. Postek; András E. Vladár
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

Scanning electron microscopes (SEM) are used extensively in research and advanced manufacturing for materials characterization, metrology and process control. Unfortunately, noise can limit the specimen-specific detail and the information that can be acquired in any SEM micrograph, or measurement made from those data. The majority of SEM measurements are done at low primary electron beam currents and fast imaging mode resulting in rather noisy signals - often too noisy. The amount and the type of the noise and the steps taken to deal with it are critical to the quality and amount of the information gathered. This fifth presentation, in this series of SEM dimensional metrology tutorial papers, discusses some of the various causes of measurement uncertainty in scanned particle beam instruments specifically dealing with signal-to-noise (SNR) and its contribution to measurement imprecision.

Paper Details

Date Published: 15 September 2016
PDF: 10 pages
Proc. SPIE 9927, Nanoengineering: Fabrication, Properties, Optics, and Devices XIII, 99270G (15 September 2016); doi: 10.1117/12.2236478
Show Author Affiliations
Michael T. Postek, National Institute of Standards and Technology (United States)
András E. Vladár, National Institute of Standards and Technology (United States)

Published in SPIE Proceedings Vol. 9927:
Nanoengineering: Fabrication, Properties, Optics, and Devices XIII
Eva M. Campo; Elizabeth A. Dobisz; Louay A. Eldada, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?