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Proceedings Paper

Digital holography with electron wave: measuring into the nanoworld
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Paper Abstract

Dennis Gabor invented Holography in 1949. His main concern at the time was centered on the spherical aberration correction in the recently created electron microscopes, especially after O. Scherzer had shown mathematically that round electron optical lenses always have a positive spherical aberration coefficient and the mechanical requirements for minimizing the spherical aberration were too high to allow for atomic resolution. At the time the lack of coherent electron sources meant that in-line holography was developed using quasi-coherent light sources. As such Holography did not produce scientific good enough results to be considered a must use tool. In 1956, G. Moellenstedt invented a device called a wire-biprism that allowed the object and reference beams to be combined in an off-axis configuration. The invention of the laser at the end of the 1950s gave a great leap to Holography since this light source was highly coherent and hence led to the invention of Holographic Interferometry during the first lustrum of the 1960s. This new discipline in the Optics field has successfully evolved to become a trusted tool in a wide variety of areas. Coherent electron sources were made available only by the late 1970s, a fact that gave an outstanding impulse to electron holography so that today nanomaterials and structures belonging to a wide variety of subjects can be characterized in regards to their physical and mechanical parameters. This invited paper will present and discuss electron holography’s state of the art applications to study the shape of nanoparticles and bacteria, and the qualitative and quantitative study of magnetic and electric fields produced by novel nano-structures.

Paper Details

Date Published: 26 April 2016
PDF: 5 pages
Proc. SPIE 9890, Optical Micro- and Nanometrology VI, 989006 (26 April 2016); doi: 10.1117/12.2235172
Show Author Affiliations
Fernando Mendoza Santoyo, Ctr. de Investigaciones en Óptica, A.C. (Mexico)
Edgar Voelkl, Hitachi High Technologies, Ltd. (United States)

Published in SPIE Proceedings Vol. 9890:
Optical Micro- and Nanometrology VI
Christophe Gorecki; Anand Krishna Asundi; Wolfgang Osten, Editor(s)

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