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Proceedings Paper

Fabrication of dual-wavelength diffractive beam splitters using maskless optical lithography with a digital micromirror device
Author(s): Jun Amako; Shinozaki Yu
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Paper Abstract

In this paper, we demonstrate a dual-wavelength diffractive beam splitter to be used in parallel laser processing. The novel optical element, which is formed in a transparent material, generates two beam arrays at different wavelengths and allows their overlap at the process points on a workpiece. Since the splitter has a stochastically designed, complex, and deep surface profile, there is limited freedom in selecting a fabrication method. We designed the splitter using a simulated annealing algorithm and fabricated it in a photoresist through maskless exposure by using a digital micromirror device. We characterized the designed splitter, thereby corroborating the proposed beam-splitting concept.

Paper Details

Date Published: 15 March 2016
PDF: 7 pages
Proc. SPIE 9780, Optical Microlithography XXIX, 97801T (15 March 2016); doi: 10.1117/12.2229178
Show Author Affiliations
Jun Amako, Toyo Univ. (Japan)
Shinozaki Yu, Toyo Univ. (Japan)

Published in SPIE Proceedings Vol. 9780:
Optical Microlithography XXIX
Andreas Erdmann; Jongwook Kye, Editor(s)

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