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Proceedings Paper

Direct sub-micron microstructuring on cylinder using TiO2 sol-gel process and radial phase mask based lithography
Author(s): L. Berthod; F. Vocanson; M. Langlet; C. Veillas; S. Reynaud; I. Verrier; J. Laukkanen; O. Parriaux; Y. Jourlin
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Paper Abstract

Design and fabrication of a high efficiency phase mask have been performed for printing submicron period gratings along 8 mm diameter glass cylinders. In this article, the authors present the radial phase mask specially designed and manufactured for a cylindrical surface micro-structuring under UV photolithography. Its period is sub-micron (480 nm < ΛPM < 720 nm). The authors describe then the phase mask based UV lithography set-up using the interference between the transmitted beams of +1 and -1 orders generated by the phase mask. Preliminary results of printed gratings on a cylinder are described on a sol-gel TiO2 thin film layer, enabling direct photo patterning on functionalized layer. The feasibility of a grating printed with a period of Λcylin = 960 nm on an 8 mm diameter cylinder with this dedicated mask has been demonstrated.

Paper Details

Date Published: 27 April 2016
PDF: 8 pages
Proc. SPIE 9888, Micro-Optics 2016, 988808 (27 April 2016); doi: 10.1117/12.2227700
Show Author Affiliations
L. Berthod, Univ. Jean Monnet Saint-Etienne, CNRS (France)
Univ. Grenoble Alpes (France)
Lab. des Matériaux et du Génie Physique, CNRS (France)
F. Vocanson, Univ. Jean Monnet Saint-Etienne, CNRS (France)
M. Langlet, Univ. Grenoble Alpes (France)
Lab. des Matériaux et du Génie Physique, CNRS (France)
C. Veillas, Univ. Jean Monnet Saint-Etienne, CNRS (France)
S. Reynaud, Univ. Jean Monnet Saint-Etienne, CNRS (France)
I. Verrier, Univ. Jean Monnet Saint-Etienne, CNRS (France)
J. Laukkanen, Univ. of Eastern Finland (Finland)
O. Parriaux, Univ. Jean Monnet Saint-Etienne, CNRS (France)
Y. Jourlin, Univ. Jean Monnet Saint-Etienne, CNRS (France)


Published in SPIE Proceedings Vol. 9888:
Micro-Optics 2016
Hugo Thienpont; Jürgen Mohr; Hans Zappe; Hirochika Nakajima, Editor(s)

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