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Proceedings Paper

X-ray microlithography exposure system for high aspect ratio micromachining
Author(s): Yuli Vladimirsky; Kevin J. Morris; J. Michael Klopf; Olga Vladimirsky; Volker Saile
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Paper Abstract

A new x-ray micro-lithography exposure system has been designed and built at CAMD to meet specific demands of synchrotron radiation assisted high aspect ratio micromachining. The system consists of a broad-band transmission (1.2 angstroms to 6.5 angstroms) beamline and a multi-chamber X-ray Exposure Station. The beam line accepts radiation emitted in a bending magnet of the CAMD 1.3 - 1.5 GeV synchrotron storage ring. The beam line is approximately 10 m long and terminates with 125 micrometers thick Be window which defines an X-ray beam of 50 X 10 mm2 at the exposure plane. The beam line is configured to provide 1.0 W/cm2 at 1.5 GeV and 100 mA storage ring operation. The Exposure Station is designed to control different exposure conditions and can handle a variety of mask/sample assemblies. The first camber of the exposure tool is designated as a radiation filter, it controls x-ray spectra using foils and inert gases, and optimizes dose delivered to a sample with a thick resist (in excess of 1 mm). The second chamber is equipped with a multi-axes scanning mechanism to provide designed orientation and exposure of the mask/sample assembly. The two chamber can be separated by a thin foil to facilitate the use of reactive atmospheres for radiation induced chemical processes during exposure. An expansion of the Exposure Station providing large area exposures (up to 300 X 300 mm2) is described.

Paper Details

Date Published: 26 September 1995
PDF: 9 pages
Proc. SPIE 2640, Microlithography and Metrology in Micromachining, (26 September 1995); doi: 10.1117/12.222654
Show Author Affiliations
Yuli Vladimirsky, Louisiana State Univ. (United States)
Kevin J. Morris, Louisiana State Univ. (United States)
J. Michael Klopf, Louisiana State Univ. (United States)
Olga Vladimirsky, Louisiana State Univ. (United States)
Volker Saile, Louisiana State Univ. (United States)

Published in SPIE Proceedings Vol. 2640:
Microlithography and Metrology in Micromachining
Michael T. Postek, Editor(s)

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