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Proceedings Paper

Fabrication of miniaturized electrostatic deflectors using LIGA
Author(s): Keith H. Jackson; Chantal G. Khan Malek; Lawrence P. Murray; William D. Bonivert; Jill M. Hruby; John T. Hachman; T. H.J. Chang
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Paper Abstract

We are currently investigating the fabrication of high precision, miniaturized, electrostatic deflectors for use in electron or ion beam micro-columns. These columns can be used in a broad array of applications including microscopy, spectroscopy and lithography. Typically, micro-columns consist of a field emitter tip, a set of micromachined miniaturized lenses and one or more electrostatic deflectors. Miniaturization of the column allows the use of simple electrostatic lenses to achieve very high performance in a package that is just a few millimeters in length. Presently, all reported microcolumns have included miniaturized but conventionally-machined octupole deflector plates. If micromachined plates are used instead, lower deflection voltage is required for deflection, and the system becomes more amenable to very high speed operation. In addition, some reduction in scan field distortion is expected. These improvements results directly from the higher degree of miniaturization, tighter dimensional control, better placement accuracy, and smoother facets offered by micromachining. Given the dimensions (100 micrometers - 1000 micrometers thick) and tolerances (1 - 10 micrometers ) required, LIGA is well suited to fabricate such miniature deflectors. This paper will describe the fabrication of the deflectors using LIGA. The Center for X-ray Optics has built an endstation at Lawrence Berkeley National Laboratory's Advanced Light Source suitable for LIGA X-ray exposures.

Paper Details

Date Published: 26 September 1995
PDF: 10 pages
Proc. SPIE 2640, Microlithography and Metrology in Micromachining, (26 September 1995); doi: 10.1117/12.222649
Show Author Affiliations
Keith H. Jackson, Lawrence Berkeley National Lab. (United States)
Chantal G. Khan Malek, Lawrence Berkeley National Lab. (United States)
Lawrence P. Murray, Lawrence Berkeley National Lab. (United States)
William D. Bonivert, Sandia National Lab. (United States)
Jill M. Hruby, Sandia National Lab. (United States)
John T. Hachman, Sandia National Lab. (United States)
T. H.J. Chang, IBM Thomas J. Watson Research Ctr. (United States)

Published in SPIE Proceedings Vol. 2640:
Microlithography and Metrology in Micromachining
Michael T. Postek, Editor(s)

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