Share Email Print

Proceedings Paper • Open Access

Holistic lithography and metrology's importance in driving patterning fidelity
Author(s): Martin van den Brink

Paper Abstract

There has been 43 years of overlay metrology in microlithography, and how did we get here? This presentation covered three areas: stepper metrology improvements, improved correction potential, and extended feedback loop outside stepper. The presenter went on to discuss where we are today In terms of holistic lithography, as well as where we are going with the future of holistic lithography.

Paper Details

Date Published: 18 April 2016
PDF: 28 pages
Proc. SPIE 9778, Metrology, Inspection, and Process Control for Microlithography XXX, 977802 (18 April 2016); doi: 10.1117/12.2225538
Show Author Affiliations
Martin van den Brink, ASML Netherlands B.V. (Netherlands)

Published in SPIE Proceedings Vol. 9778:
Metrology, Inspection, and Process Control for Microlithography XXX
Martha I. Sanchez, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?