Proceedings Paper • Open Access
Holistic lithography and metrology's importance in driving patterning fidelity
Paper Abstract
There has been 43 years of overlay metrology in microlithography, and how did we get here? This presentation covered three areas: stepper metrology improvements, improved correction potential, and extended feedback loop outside stepper. The presenter went on to discuss where we are today In terms of holistic lithography, as well as where we are going with the future of holistic lithography.
Paper Details
Date Published: 18 April 2016
PDF: 28 pages
Proc. SPIE 9778, Metrology, Inspection, and Process Control for Microlithography XXX, 977802 (18 April 2016); doi: 10.1117/12.2225538
Published in SPIE Proceedings Vol. 9778:
Metrology, Inspection, and Process Control for Microlithography XXX
Martha I. Sanchez, Editor(s)
PDF: 28 pages
Proc. SPIE 9778, Metrology, Inspection, and Process Control for Microlithography XXX, 977802 (18 April 2016); doi: 10.1117/12.2225538
Show Author Affiliations
Martin van den Brink, ASML Netherlands B.V. (Netherlands)
Published in SPIE Proceedings Vol. 9778:
Metrology, Inspection, and Process Control for Microlithography XXX
Martha I. Sanchez, Editor(s)
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