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Proceedings Paper

Patterning of graphene on silicon-on-insulator waveguides through laser ablation and plasma etching
Author(s): Jürgen Van Erps; Tymoteusz Ciuk; Iwona Pasternak; Aleksandra Krajewska; Wlodek Strupinski; Steven Van Put; Geert Van Steenberge; Kitty Baert; Herman Terryn; Hugo Thienpont; Nathalie Vermeulen
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Paper Abstract

We present the use of femtosecond laser ablation for the removal of monolayer graphene from silicon-on-insulator (SOI) waveguides, and the use of oxygen plasma etching through a metal mask to peel off graphene from the grating couplers attached to the waveguides. Through Raman spectroscopy and atomic force microscopy, we show that the removal of graphene is successful with minimal damage to the underlying SOI waveguides. Finally, we employ both removal techniques to measure the contribution of graphene to the loss of grating-coupled graphene-covered SOI waveguides using the cut-back method. This loss contribution is measured to be 0.132 dB/μm.

Paper Details

Date Published: 13 May 2016
PDF: 7 pages
Proc. SPIE 9891, Silicon Photonics and Photonic Integrated Circuits V, 98910T (13 May 2016); doi: 10.1117/12.2225224
Show Author Affiliations
Jürgen Van Erps, Vrije Univ. Brussel (Belgium)
Tymoteusz Ciuk, Institute of Electronic Materials Technology (Poland)
Iwona Pasternak, Institute of Electronic Materials Technology (Poland)
Aleksandra Krajewska, Institute of Electronic Materials Technology (Poland)
Wlodek Strupinski, Institute of Electronic Materials Technology (Poland)
Steven Van Put, IMEC (Belgium)
Univ. Gent (Belgium)
Geert Van Steenberge, IMEC (Belgium)
Univ. Gent (Belgium)
Kitty Baert, Vrije Univ. Brussel (Belgium)
Herman Terryn, Vrije Univ. Brussel (Belgium)
Hugo Thienpont, Vrije Univ. Brussel (Belgium)
Nathalie Vermeulen, Vrije Univ. Brussel (Belgium)

Published in SPIE Proceedings Vol. 9891:
Silicon Photonics and Photonic Integrated Circuits V
Laurent Vivien; Lorenzo Pavesi; Stefano Pelli, Editor(s)

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