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Proceedings Paper

Source mask optimization study based on latest Nikon immersion scanner
Author(s): Jun Zhu; Fang Wei; Lijun Chen; Chenming Zhang; Wei Zhang; Hisashi Nishinaga; Omar El-Sewefy; Gen-Sheng Gao; Neal Lafferty; Jason Meiring; Recoo Zhang; Cynthia Zhu
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Paper Abstract

The 2x nm logic foundry node has many challenges since critical levels are pushed close to the limits of low k1 ArF water immersion lithography. For these levels, improvements in lithographic performance can translate to decreased rework and increased yield. Source Mask Optimization (SMO) is one such route to realize these image fidelity improvements. During SMO, critical layout constructs are intensively optimized in both the mask and source domain, resulting in a solution for maximum lithographic entitlement. From the hardware side, advances in source technology have enabled free-form illumination. The approach allows highly customized illumination, enabling the practical application of SMO sources. The customized illumination sources can be adjusted for maximum versatility. In this paper, we present a study on a critical layer of an advanced foundry logic node using the latest ILT based SMO software, paired with state-of-the-art scanner hardware and intelligent illuminator. Performance of the layer's existing POR source is compared with the ideal SMO result and the installed source as realized on the intelligent illuminator of an NSR-S630D scanner. Both simulation and on-silicon measurements are used to confirm that the performance of the studied layer meets established specifications.

Paper Details

Date Published: 15 March 2016
PDF: 7 pages
Proc. SPIE 9780, Optical Microlithography XXIX, 97801P (15 March 2016); doi: 10.1117/12.2223576
Show Author Affiliations
Jun Zhu, Fudan Univ. (China)
Fang Wei, Shanghai Huali Microelectronics Corp. (China)
Lijun Chen, Shanghai Huali Microelectronics Corp. (China)
Chenming Zhang, Shanghai Huali Microelectronics Corp. (China)
Wei Zhang, Fudan Univ. (China)
Hisashi Nishinaga, Nikon Corp. (Japan)
Omar El-Sewefy, Mentor Graphics Corp. (Egypt)
Gen-Sheng Gao, Mentor Graphics Shanghai (China)
Neal Lafferty, Mentor Graphics Corp. (United States)
Jason Meiring, Mentor Graphics Corp. (United States)
Recoo Zhang, Mentor Graphics Shanghai (China)
Cynthia Zhu, Mentor Graphics Corp. (United States)

Published in SPIE Proceedings Vol. 9780:
Optical Microlithography XXIX
Andreas Erdmann; Jongwook Kye, Editor(s)

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