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Proceedings Paper

Advances in the detection capability on actinic blank inspection
Author(s): Takeshi Yamane; Tsuyoshi Amano; Noriaki Takagi; Hidehiro Watanabe; Ichro Mori; Tomohisa Ino; Tomohiro Suzuki; Kiwamu Takehisa; Hiroki Miyai; Haruhiko Kusunose
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Paper Abstract

Improvements in the detection capability of a high-volume-manufacturing (HVM) actinic blank inspection (ABI) prototype for native defects caused by illumination numerical aperture (NA) enlargement were evaluated. A mask blank was inspected by varying the illumination NA. The defect signal intensity increased with illumination NA enlargement as predicted from simulation. The mask blank was also inspected with optical tools, and no additional phase defect was detected. All of the printable phase defects were verified to have been detected by the HVM ABI prototype.

Paper Details

Date Published: 18 March 2016
PDF: 6 pages
Proc. SPIE 9776, Extreme Ultraviolet (EUV) Lithography VII, 97761G (18 March 2016); doi: 10.1117/12.2222747
Show Author Affiliations
Takeshi Yamane, EUVL Infrastructure Development Ctr., Inc. (Japan)
Tsuyoshi Amano, EUVL Infrastructure Development Ctr., Inc. (Japan)
Noriaki Takagi, EUVL Infrastructure Development Ctr., Inc. (Japan)
Hidehiro Watanabe, EUVL Infrastructure Development Ctr., Inc. (Japan)
Ichro Mori, EUVL Infrastructure Development Ctr., Inc. (Japan)
Tomohisa Ino, Lasertec Corp. (Japan)
Tomohiro Suzuki, Lasertec Corp. (Japan)
Kiwamu Takehisa, Lasertec Corp. (Japan)
Hiroki Miyai, Lasertec Corp. (Japan)
Haruhiko Kusunose, Lasertec Corp. (Japan)

Published in SPIE Proceedings Vol. 9776:
Extreme Ultraviolet (EUV) Lithography VII
Eric M. Panning, Editor(s)

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