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Proceedings Paper

An integrated source/mask/DSA optimization approach
Author(s): Tim Fühner; Przemysław Michalak; Ulrich Welling; Juan Carlos Orozco-Rey; Marcus Müller; Andreas Erdmann
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Paper Abstract

The introduction of DSA for lithography is still obstructed by a number of technical issues including the lack of a comprehensive computational platform. This work presents a direct source/mask/DSA optimization (SMDSAO) method, which incorporates standard lithographic metrics and figures of merit such as the maximization of process windows. The procedure is demonstrated for a contact doubling example, assuming grapho-epitaxy-DSA. To retain a feasible runtime, a geometry-based Interface Hamiltonian DSA model is employed. The feasibility of this approach is demonstrated through several results and their comparison with more rigorous DSA models.

Paper Details

Date Published: 23 March 2016
PDF: 12 pages
Proc. SPIE 9780, Optical Microlithography XXIX, 97800M (23 March 2016); doi: 10.1117/12.2222170
Show Author Affiliations
Tim Fühner, Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB (Germany)
Przemysław Michalak, Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB (Germany)
Ulrich Welling, Georg-August-Univ. Göttingen (Germany)
Juan Carlos Orozco-Rey, Georg-August-Univ. Göttingen (Germany)
Marcus Müller, Georg-August-Univ. Göttingen (Germany)
Andreas Erdmann, Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB (Germany)


Published in SPIE Proceedings Vol. 9780:
Optical Microlithography XXIX
Andreas Erdmann; Jongwook Kye, Editor(s)

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