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Proceedings Paper

A study of swing-curve physics in diffraction-based overlay
Author(s): Kaustuve Bhattacharyya; Arie den Boef; Greet Storms; Joost van Heijst; Marc Noot; Kevin An; Noh-Kyoung Park; Se-Ra Jeon; Nang-Lyeom Oh; Elliott McNamara; Frank van de Mast; SeungHwa Oh; Seung Yoon Lee; Chan Hwang; Kuntack Lee
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Paper Abstract

With the increase of process complexity in advanced nodes, the requirements of process robustness in overlay metrology continues to tighten. Especially with the introduction of newer materials in the film-stack along with typical stack variations (thickness, optical properties, profile asymmetry etc.), the signal formation physics in diffraction-based overlay (DBO) becomes an important aspect to apply in overlay metrology target and recipe selection.

In order to address the signal formation physics, an effort is made towards studying the swing-curve phenomena through wavelength and polarizations on production stacks using simulations as well as experimental technique using DBO. The results provide a wealth of information on target and recipe selection for robustness. Details from simulation and measurements will be reported in this technical publication.

Paper Details

Date Published: 24 March 2016
PDF: 6 pages
Proc. SPIE 9778, Metrology, Inspection, and Process Control for Microlithography XXX, 97781I (24 March 2016); doi: 10.1117/12.2222040
Show Author Affiliations
Kaustuve Bhattacharyya, ASML Netherlands B.V. (Netherlands)
Arie den Boef, ASML Netherlands B.V. (Netherlands)
Greet Storms, ASML Netherlands B.V. (Netherlands)
Joost van Heijst, ASML Netherlands B.V. (Netherlands)
Marc Noot, ASML Netherlands B.V. (Netherlands)
Kevin An, ASML Netherlands B.V. (Netherlands)
Noh-Kyoung Park, ASML Netherlands B.V. (Netherlands)
Se-Ra Jeon, ASML Netherlands B.V. (Netherlands)
Nang-Lyeom Oh, ASML Korea Co., Ltd. (Korea, Republic of)
Elliott McNamara, ASML Netherlands B.V. (Netherlands)
Frank van de Mast, ASML Netherlands B.V. (Netherlands)
SeungHwa Oh, Samsung Electronics Co., Ltd. (Korea, Republic of)
Seung Yoon Lee, Samsung Electronics Co., Ltd. (Korea, Republic of)
Chan Hwang, Samsung Electronics Co., Ltd. (Korea, Republic of)
Kuntack Lee, Samsung Electronics Co., Ltd. (Korea, Republic of)

Published in SPIE Proceedings Vol. 9778:
Metrology, Inspection, and Process Control for Microlithography XXX
Martha I. Sanchez, Editor(s)

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