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Proceedings Paper

Alternative high-resolution lithographic technologies for optical applications
Author(s): Uwe D. Zeitner; Tina Weichelt; Yannick Bourgin; Robert Kinder
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Paper Abstract

Modern optical applications have special demands on the lithographic fabrication technologies. This relates to the lateral shape of the structures as well as to their three dimensional surface profile. On the other hand optical nano-structures are often periodic which allows for the use of dedicated lithographic exposure principles. The paper briefly reviews actual developments in the field of optical nano-structure generation. Special emphasis will be given to two technologies: electron-beam lithography based on a flexible cell-projection method and the actual developments in diffractive mask aligner lithography. Both offer a cost effective fabrication alternative for high resolution structures or three-dimensional optical surface profiles.

Paper Details

Date Published: 15 March 2016
PDF: 7 pages
Proc. SPIE 9780, Optical Microlithography XXIX, 97800R (15 March 2016); doi: 10.1117/12.2222028
Show Author Affiliations
Uwe D. Zeitner, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Friedrich-Schiller-Univ. Jena (Germany)
Tina Weichelt, Friedrich-Schiller-Univ. Jena (Germany)
Yannick Bourgin, Friedrich-Schiller-Univ. Jena (Germany)
Robert Kinder, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)


Published in SPIE Proceedings Vol. 9780:
Optical Microlithography XXIX
Andreas Erdmann; Jongwook Kye, Editor(s)

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