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Proceedings Paper

Improvement of unbalanced illumination induced telecentricity within the exposure slit
Author(s): Jonghoon Jang; ByeongSoo Lee; Young Seog Kang; Chansam Chang; Jeong-Heung Kong; Young Ha Kim; Wim Bouman; Roelof de Graaf; Stefan Weichselbaum; Richard Droste; Wim P. de Boeij; Bart van Bussel; Patrick Neefs; Arij Rijke
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Paper Abstract

Adjustment and control of the illumination pupil asymmetry is relevant for wafer alignment and overlay of lithography tools. Pupil asymmetries can cause a tilt in aerial image (Aerial Image Tilt, or AIT). This AIT, combined with a focus offset, leads to a horizontal image shift. Pupil asymmetries can be related to a shift of the entire illumination pupil (geometrical telecentricity) caused by illuminator misalign. Another type of pupil asymmetry is energetic imbalance (quantified by pupil Center of Gravity, COG). The scanner can show pupil variation across the exposure slit.

In general the COG at the edge of the slit is often worse than in the center part of the slit. Recently, ASML has released the NXT:1980Di that is equipped with an enhanced illuminator to improve pupil COG variation across the slit. In this paper we explore the performance of this scanner system and show that the AIT variation across the slit is also reduced significantly.

Paper Details

Date Published: 15 March 2016
PDF: 5 pages
Proc. SPIE 9780, Optical Microlithography XXIX, 97800X (15 March 2016); doi: 10.1117/12.2220588
Show Author Affiliations
Jonghoon Jang, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
ByeongSoo Lee, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Young Seog Kang, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Chansam Chang, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Jeong-Heung Kong, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Young Ha Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Wim Bouman, ASML Netherlands B.V. (Netherlands)
Roelof de Graaf, ASML Netherlands B.V. (Netherlands)
Stefan Weichselbaum, ASML Netherlands B.V. (Netherlands)
Richard Droste, ASML Netherlands B.V. (Netherlands)
Wim P. de Boeij, ASML Netherlands BV (Netherlands)
Bart van Bussel, ASML Netherlands B.V. (Netherlands)
Patrick Neefs, ASML Netherlands B.V. (Netherlands)
Arij Rijke, ASML Netherlands B.V. (Netherlands)

Published in SPIE Proceedings Vol. 9780:
Optical Microlithography XXIX
Andreas Erdmann; Jongwook Kye, Editor(s)

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