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Proceedings Paper

Evaluation of water based intelligent fluids for resist stripping in single wafer cleaning tools
Author(s): Matthias Rudolph; Silvio Esche; Christoph Hohle; Dirk Schumann; Philipp Steinke; Xaver Thrun; Justus von Sonntag
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Paper Abstract

The application of phasefluid based intelligent fluids® in the field of photoresist stripping was studied. Due to their highly dynamic inner structure, phasefluids penetrate into the polymer network of photoresists and small gaps between resist layer and substrate and lift off the material from the surface. These non-aggressive stripping fluids were investigated regarding their efficiency in various resist stripping applications including initial results on copper metallization. Furthermore intelligent fluids® have been evaluated on an industry standard high volume single wafer cleaner. A baseline process on 300 mm wafers has been developed and characterized in terms of metallic and ionic impurities and defect level. Finally a general proof of concept for removal of positive tone resist from 300 mm silicon wafers is demonstrated.

Paper Details

Date Published: 21 March 2016
PDF: 10 pages
Proc. SPIE 9779, Advances in Patterning Materials and Processes XXXIII, 977919 (21 March 2016); doi: 10.1117/12.2220156
Show Author Affiliations
Matthias Rudolph, Fraunhofer Institute for Photonic Microsystems (Germany)
Silvio Esche, bubbles and beyond GmbH (Germany)
Christoph Hohle, Fraunhofer Institute for Photonic Microsystems (Germany)
Dirk Schumann, bubbles and beyond GmbH (Germany)
Philipp Steinke, Fraunhofer Institute for Photonic Microsystems (Germany)
Xaver Thrun, Fraunhofer Institute for Photonic Microsystems (Germany)
Justus von Sonntag, bubbles and beyond GmbH (Germany)


Published in SPIE Proceedings Vol. 9779:
Advances in Patterning Materials and Processes XXXIII
Christoph K. Hohle; Rick Uchida, Editor(s)

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