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Proceedings Paper

Energy effective dual-pulse bispectral laser for EUV lithography
Author(s): A. P. Zhevlakov; R. P. Seisyan; V. G. Bespalov; V. V. Elizarov; A. S. Grishkanich; S. V. Kascheev; I. S. Sidorov
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Paper Abstract

The power consumption in the two-pulse bispectral primary source could be substantially decreased by replacing the SRS converters from 1.06 μm into 10.6 μm wavelength as the preamplifier cascades in СО2 laser channel at the same efficiency radiation of EUV source. The creation of high volume manufacturing lithography facilities with the technological standard of 10-20 nm is related to the implementation of resist exposure modes with pulse repetition rate of 100 kHz. Low power consumption of the proposed scheme makes it promising for the creation of LPP EUV sources.

Paper Details

Date Published: 18 March 2016
PDF: 10 pages
Proc. SPIE 9776, Extreme Ultraviolet (EUV) Lithography VII, 97760Q (18 March 2016); doi: 10.1117/12.2219931
Show Author Affiliations
A. P. Zhevlakov, ITMO Univ. (Russian Federation)
R. P. Seisyan, Ioffe Physical Technical Institute (Russian Federation)
V. G. Bespalov, ITMO Univ. (Russian Federation)
V. V. Elizarov, ITMO Univ. (Russian Federation)
A. S. Grishkanich, ITMO Univ. (Russian Federation)
S. V. Kascheev, ITMO Univ. (Russian Federation)
I. S. Sidorov, Univ. of Eastern Finland (Finland)

Published in SPIE Proceedings Vol. 9776:
Extreme Ultraviolet (EUV) Lithography VII
Eric M. Panning, Editor(s)

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