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Proceedings Paper

Optical metrology for advanced process control: full module metrology solutions
Author(s): Cornel Bozdog; Igor Turovets
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Paper Abstract

Optical metrology is the workhorse metrology in manufacturing and key enabler to patterning process control. Recent advances in device architecture are gradually shifting the need for process control from the lithography module to other patterning processes (etch, trim, clean, LER/LWR treatments, etc..). Complex multi-patterning integration solutions, where the final pattern is the result of multiple process steps require a step-by-step holistic process control and a uniformly accurate holistic metrology solution for pattern transfer for the entire module. For effective process control, more process “knobs” are needed, and a tighter integration of metrology with process architecture.

Paper Details

Date Published: 23 March 2016
PDF: 12 pages
Proc. SPIE 9782, Advanced Etch Technology for Nanopatterning V, 97820E (23 March 2016); doi: 10.1117/12.2219919
Show Author Affiliations
Cornel Bozdog, ReVera Inc. (United States)
Igor Turovets, Nova Measuring Instruments Ltd. (Israel)

Published in SPIE Proceedings Vol. 9782:
Advanced Etch Technology for Nanopatterning V
Qinghuang Lin; Sebastian U. Engelmann, Editor(s)

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