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Proceedings Paper

Expected innovations of optical lithography in the next 10 years
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Paper Abstract

In the past 10 years, immersion lithography has been the most effective high volume manufacturing method for the critical layers of semiconductor devices. Thinking of the next 10 years, we can expect continuous improvement on existing 300 mm wafer scanners with better accuracy and throughput to enhance the total output value per input cost. This value productivity, however, can be upgraded also by larger innovations which might happen in optical lithography. In this paper, we will discuss the possibilities and the impossibilities of potential innovation ideas of optical lithography, which are 450 mm wafer, optical maskless, multicolor lithography, and metamaterial.

Paper Details

Date Published: 15 March 2016
PDF: 10 pages
Proc. SPIE 9780, Optical Microlithography XXIX, 978004 (15 March 2016); doi: 10.1117/12.2219918
Show Author Affiliations
Soichi Owa, Nikon Corp. (Japan)
Noriyuki Hirayanagi, Nikon Corp. (Japan)

Published in SPIE Proceedings Vol. 9780:
Optical Microlithography XXIX
Andreas Erdmann; Jongwook Kye, Editor(s)

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