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Proceedings Paper

Impact of bandwidth variation on OPC model accuracy
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Paper Abstract

Over the years, Lithography Engineers continue to focus on CD control, overlay and process capability to meet current node requirements for yield and device performance. Reducing or eliminating variability in any process will have significant impact, but the sources of variability in any lithography process are many. The goal from the light source manufacturer is to further enable capability and reduce variation through a number of parameters. (1, 2, 3, 4)

Recent improvements in bandwidth control have been realized in the XLR platform with Cymer’s DynaPulseTM control technology. This reduction in bandwidth variation translates in the further reduction of CD variation in device structures 5,6. The Authors will review the methodology for determining the impact that bandwidth variation has on CD dose, focus, pitch and bandwidth, which is required to build a dynamic model. This assists in understanding the impact that bandwidth variability has on the accuracy of the Source and Mask optimization and the overall OPC model, which is reviewed and demonstrated.

Paper Details

Date Published: 23 March 2016
PDF: 10 pages
Proc. SPIE 9780, Optical Microlithography XXIX, 97800K (23 March 2016); doi: 10.1117/12.2219892
Show Author Affiliations
Will Conley, Cymer LLC (United States)
Paolo Alagna, Cymer LLC (United States)
Stephen Hsu, ASML Brion (United States)
Qian Zhao, ASML Brion (United States)

Published in SPIE Proceedings Vol. 9780:
Optical Microlithography XXIX
Andreas Erdmann; Jongwook Kye, Editor(s)

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