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Proceedings Paper

Layer aware source mask target optimization
Author(s): Ao Chen; Yee Mei Foong; Jessy Schramm; Liang Ji; Stephen Hsu; James Guerrero; Xiaoyang Li; Joe Shaw; Joe Wang
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Paper Abstract

In this paper, we present the approach and results of layer-aware source mask target optimization. In this approach, the design target is co-optimized during source mask optimization (SMO) by considering inter-layer constraints. We tested the method on a 2x nm node metal layer by using both standard and customized cost functions for source optimization. Variable targets were defined for two process window limiting critical pattern cells, with contact-to-metal and metal-tovia coverage rules taken into consideration. The results indicate that layer-aware source mask target optimization gives consistent process window improvement over conventional SMO. The optimized targets prove to be a good balance between lithography process window and post-etch inter-layer coverage margin.

Paper Details

Date Published: 15 March 2016
PDF: 9 pages
Proc. SPIE 9780, Optical Microlithography XXIX, 97801A (15 March 2016); doi: 10.1117/12.2219864
Show Author Affiliations
Ao Chen, GLOBALFOUNDRIES Singapore (Singapore)
Yee Mei Foong, GLOBALFOUNDRIES Singapore (Singapore)
Jessy Schramm, GLOBALFOUNDRIES Germany (Germany)
Liang Ji, GLOBALFOUNDRIES Singapore (Singapore)
Stephen Hsu, ASML Brion (United States)
James Guerrero, ASML Brion (United States)
Xiaoyang Li, ASML Brion (United States)
Joe Shaw, ASML Brion (United States)
Joe Wang, ASML Brion (United States)

Published in SPIE Proceedings Vol. 9780:
Optical Microlithography XXIX
Andreas Erdmann; Jongwook Kye, Editor(s)

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