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Systematic investigation of the synthesis, characterization and switching mechanism of metal oxide nanoparticle resists
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Paper Abstract

Metal oxide nanoparticle resists have recently emerged as next generation photoresist materials which exhibit promising performance for extreme ultraviolet lithography. In this present work, we are able to show our ability to synthesize and well characterize small uniform metal oxide nanoparticles, to present stability study of the nanoparticles in the resist solvent over time, to pattern ~20 nm features by electron beam lithography, and to provide an insight into the insolubilization mechanism of the resist system.

Paper Details

Date Published: 21 March 2016
PDF: 12 pages
Proc. SPIE 9779, Advances in Patterning Materials and Processes XXXIII, 97790J (21 March 2016); doi: 10.1117/12.2219638
Show Author Affiliations
Meiliana Siauw, The Univ. of Queensland (Australia)
Ke Du, The Univ. of Queensland (Australia)
David Valade, The Univ. of Queensland (Australia)
Peter Trefonas, Dow Electronic Materials (United States)
James W. Thackeray, Dow Electronic Materials (United States)
Andrew Whittaker, The Univ. of Queensland (Australia)
Idriss Blakey, The Univ. of Queensland (Australia)

Published in SPIE Proceedings Vol. 9779:
Advances in Patterning Materials and Processes XXXIII
Christoph K. Hohle; Rick Uchida, Editor(s)

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